Deposition sensor based on differential heat flux measurement
US7077563B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 19, 2003 |
| Grant date | Jul 18, 2006 |
| Priority date | — |
| Expiry date | Nov 19, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N25/18
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus and method for the monitoring and measurement of chemical and/or biological deposition in heat exchangers and other fluid processing vessels. The new and original sensing system includes at least two hollow fluid vessels conductively mounted across a constant heat transfer path. Thin film heat flux sensors are attached to a heat transfer surface of the vessels in order to measure changes in differential heat flux that occur when deposition begins to accumulate in the vessel. In this way, it is shown that differential heat flux measurements can be used to detect and measure the early onset of chemical and/or biological deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.