Patent · US Expired

Method for rapid prototyping by using plane light as sources

US7079915B2 · kind B2 · utility

13Cited by
4References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 28, 2004
Grant dateJul 18, 2006
Priority date
Expiry dateOct 28, 2024

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB33Y10/00
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A method for rapid prototyping by using plane light as sources treats the raw material by two stages. The first stage includes a step of spreading raw material onto a defined zone by nozzles and rolling the material to have a flat surface and a step of illuminating the raw materials by plane light and electronic beams to cause a first time of physical or chemical changes. The second stage includes a step of using more powerful plane light source with cooperation with portable Digital Micromirror Device (DMD) or Liquid Crystal Display (LCD) to scan the selected zones of the material to cause a second time of physical or chemical changes, and a step of stacking the 2-D images so as to obtain a solid work piece.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.