Patent · US Expired

Quartz glass blank for an optical component, and manufacturing procedure and use thereof

US7080527B2 · kind B2 · utility

1Cited by
7References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 5, 2002
Grant dateJul 25, 2006
Priority date
Expiry dateJan 28, 2024

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P40/57
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: In the use according to the invention, the quartz glass blank complies with dimensioning rules (2), (3), and (4) in terms of its minimal and maximal hydrogen contents and OH-content, CH2min, CH2max, and COH, respectively, with P being the pulse number and ε being the energy density (in mJ/cm2):CH2min [molecules/cm3]=1×106ε2P,  (2)CH2max [molecules/cm3]=2×1018ε,  (3)COH [wt-ppm]=1,700×ε[mJ/cm2]0.4±50.  (4)The procedure according to the invention is characterized in that a mixed quartz glass is generated from a first and a second quartz glass by mixing the two quart…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.