Stabilizer mixtures for the protection of polymer substrates
US7081213B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 14, 2002 |
| Grant date | Jul 25, 2006 |
| Priority date | — |
| Expiry date | Feb 18, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K5/005
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A stabilizer mixture for one or more compounds of the general formula (1)and (1A) but preferably (1), wherein the groups R independently stand for an alkyl-,cycloalkyl-, aralkyl- or aryl-rest whereas the aromatic ring system may be optionally substituted by one or more groups R′ which may be identical or different and which groups R′ can be an aryl-, a saturated or unsaturated alkyl-, aralkyl- or cycloalkyl-group as well as halogen, an amino-, aminoalkyl-, aminocycloalkyl-, cyano-, thiocyano- or nitrogroup. The present invention is useful in the protection of various polymeric substrates against the damaging influence of light exposure by the long term storage of polymers. This effect can be observed especially in so-called engineering plastics (such as, for example, PC, PET, PBT, ABS, TPU).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.