Coating composition for forming low-refractive index thin layers
US7081272B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2002 |
| Grant date | Jul 25, 2006 |
| Priority date | — |
| Expiry date | Dec 13, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G77/08
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A composition comprising a fluid, silica precursor (A) obtained by subjecting alkoxysilane(s) to hydrolysis/polycondensation in the presence of an acid catalyst, a basic compound (B) having a basic hydroxyl group and/or a basic nitrogen atom, wherein the pH of a 0.1 N aqueous solution of compound (B) is 11 or more, and the vapor pressure of compound (B) is 1.3 kPa or lower at 100° C., and an organic compound (C) having a boiling point of 100° C. or higher, compound (C) being compatible with silica precursor (A), wherein the amount of compound (B) is from 0.0015 to 0.5 mol, in terms of the total molar amount of the basic hydroxyl groups and the basic nitrogen atoms in compound (B), per mole of Si atoms contained in silica precursor (A).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.