Quartz glass blank for an optical component, and manufacturing procedure and use thereof
US7082790B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 5, 2002 |
| Grant date | Aug 1, 2006 |
| Priority date | — |
| Expiry date | Jan 21, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P40/57
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.