Patent · US Expired

Solid-state imaging device and manufacturing method therefor

US7084472B2 · kind B2 · utility

18Cited by
3References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 31, 2004
Grant dateAug 1, 2006
Priority date
Expiry dateMar 31, 2024

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B3/0018
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A solid-state imaging device includes a plurality of two-dimensionally arranged photo diodes and a plurality of microlenses having substantially hemispherical shapes which cover the respective photo diodes. The microlens has a multilayer structure including at least a transparent resin upper layer which forms at least a portion of the substantially hemispherical shape, and a colored lower layer provided on a portion of the transparent resin upper layer which is located above the photo diode, with an interface between the colored lower layer and the transparent resin upper layer having a shape conforming to a surface of the photo diode.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.