Systems and methods for doubling sample rate using two-step self-servowriting
US7085093B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 15, 2004 |
| Grant date | Aug 1, 2006 |
| Priority date | — |
| Expiry date | Dec 15, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/59666
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A two-step self-servowriting process first writes an intermediate pattern based on a reference pattern, and then writes a final pattern based on the intermediate pattern, wherein the reference pattern can be a printed media or a spiral pattern. Such an approach can be utilized to reduce the noise/runout, eliminate timing eccentricity, and increase the sample rate of the final pattern. This description is not intended to be a complete description of, or limit the scope of, the invention. Other features, aspects, and objects of the invention can be obtained from a review of the specification, the figures, and the claims.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.