Patent · US Expired

Process

US7087748B2 · kind B2 · utility

1Cited by

3References

6Claims

0Family size

Assignee

SmithKline Beeacham P.L.C. · GB

Inventors

Klaus Mosbach · Halmstad, SE
Lei Ye · Lund, SE
Yihua Yu · Ellicott City, US

Key dates

Filing date	Sep 17, 2001
Grant date	Aug 8, 2006
Priority date	—
Expiry date	Sep 17, 2021

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC12P17/188
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A novel process for the removal of impurities from clavulanic acid using a selective adsorption material, in particular a molecularly imprinted polymer. Novel selective adsorption materials suitable for the process, and a process for the preparation of such selective adsorption materials, are also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.