Process for manufacturing semiconductor device and semiconductor device
US7087945B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 8, 2004 |
| Grant date | Aug 8, 2006 |
| Priority date | — |
| Expiry date | Jan 8, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F77/413
Abstract
A process for manufacturing a semiconductor device comprising the steps of: forming a transparent film on a semiconductor substrate including a photoelectric conversion section, the transparent film having a concave portion above the photoelectric conversion section; forming a material film on the transparent film, the material film being made of a photosensitive material having a refractive index higher than that of the transparent film; and irradiating selectively a predetermined portion of the material film with rays, and then developing the material film, whereby forming an intralayer lens having a convex portion facing into the concave portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.