Method and apparatus for plasma generation
US7091481B2 · kind B2 · utility
27Cited by
71References
71Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 19, 2004 |
| Grant date | Aug 15, 2006 |
| Priority date | — |
| Expiry date | Oct 23, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/246
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An RF-driven plasma source, including a pair of spaced-apart plasma electrodes, wherein the electrodes act as plates of a capacitor, the gas electrically discharges and creates a plasma of both positive and negative ions, in a clean process that enables efficient sample analysis, with preferred isolated sample photo-ionization, reduced-power operation and also including signal detection with modulated drive electronics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.