Electron beam lithography system having improved electron gun
US7095037B2 · kind B2 · utility
5Cited by
14References
30Claims
0Family size
Inventors
Key dates
| Filing date | Mar 18, 2004 |
| Grant date | Aug 22, 2006 |
| Priority date | — |
| Expiry date | Jan 24, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31779
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.