Negative resist composition
US7097959B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2005 |
| Grant date | Aug 29, 2006 |
| Priority date | — |
| Expiry date | Aug 17, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F222/105
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A negative resist composition used in a liquid-crystal display element is disclosed. The negative resist composition according to the present invention includes a binder resin consisting of a copolymer including four predetermined monomers, a (meth)acryl monomer including at least 3 (meth)acryl groups, a (meth)acryl monomer including one or two (meth)acryl groups and a photo-initiator. The negative resist composition according to the present invention may be useful to significantly increase the manufacturing yield because it shows an extremely low brittleness during a bonding process or a hot process due to good physical properties such as film retention, pattern stability, adhesion to a substrate, and chemical resistance, as well as good flexibility upon formation of the pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.