Patent · US Expired

Method of manufacturing carbon nanotube semiconductor device

US7098151B2 · kind B2 · utility

11Cited by
3References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 29, 2003
Grant dateAug 29, 2006
Priority date
Expiry dateAug 1, 2023

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/30
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Provided is a method of controlling an alignment direction of CNTs in manufacturing a carbon nanotube semiconductor device using the CNTs for a channel region formed between a source electrode and a drain electrode. In manufacturing a carbon nanotube semiconductor device including a gate electrode, a gate insulating film, a source electrode, a drain electrode, a CNT layer formed between the source electrode and the drain electrode in contact therewith, the method conducts: dropping a CNT solution obtained by dispersing CNTs in a solvent onto a region between the source electrode and the drain electrode while an alternating current voltage is applied between the source electrode and the drain electrode; and removing the solvent to control an orientation of the CNTs in the CNT layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.