Sensor apparatus and method of using same
US7100689B2 · kind B2 · utility
15Cited by
13References
46Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 23, 2003 |
| Grant date | Sep 5, 2006 |
| Priority date | — |
| Expiry date | Aug 28, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04B1/406
- WIPO fieldCivil engineering
- WIPO sectorOther fields
Abstract
The invention relates to a system and method for sensing the characteristics of a fluid in a sub-surface formation. In one embodiment, the invention relates to a sensor apparatus for sensing a chemical in a vapor emitted by a sub-surface fluid sample. In various configurations, the apparatus senses the presence and/or percentage of water, the presence of a gas, an oil/gas ratio, an aliphatic/aromatic hydrocarbon ratio, and/or the presence of corrosive or poisonous chemicals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.