Norbornene-type monomers and polymers containing pendent lactone or sultone groups
US7101654B2 · kind B2 · utility
13Cited by
36References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 14, 2004 |
| Grant date | Sep 5, 2006 |
| Priority date | — |
| Expiry date | Jan 14, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The disclosed invention relates to novel norbornene-type monomers containing pendent lactone or sultone groups. The invention also relates to norbornene-type polymers and copolymers comprising one or more repeating units represented by the formula:and containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.