Acid-degradable resin compositions containing ketene-aldehyde copolymer
US7105272B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2003 |
| Grant date | Sep 12, 2006 |
| Priority date | — |
| Expiry date | Mar 27, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I):wherein R1 and R2 independently represent hydrogen atom, halogen atom, C1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(═O)R4 group, S(O)nR4 group, P(═O)(R4)2 group or M(R4)3 group; R3 represents C1-20 hydrocarbon group or a heterocyclic group: R4 represents C1-20 hydrocarbonoxy group, C1-20 hydrocarbon group, C1-20 hydrocarbonthio group or mono- or di-C1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2, and an acid or a compound capable of generating an acid in response to an external stimulus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.