Elementary analysis device by optical emission spectrometry on laser produced plasma
US7106439B2 · kind B2 · utility
3Cited by
10References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 1, 2004 |
| Grant date | Sep 12, 2006 |
| Priority date | — |
| Expiry date | Sep 1, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/718
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
This device comprises a pulsed laser source (6), means (8, 10, 12) for focusing light from this source onto an object to be analysed (2) to produce plasma on the surface of the object, means (16, 18) of analyzing a plasma radiation spectrum, means (20) of determining the elementary composition of the object from this analysis, and possibly means (4) for displacing the object. The invention is particularly applicable to test radioactive materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.