Composition for vapor deposition, method for forming an antireflection film, and optical element
US7106515B2 · kind B2 · utility
1Cited by
11References
12Claims
0Family size
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Key dates
| Filing date | Nov 13, 2001 |
| Grant date | Sep 12, 2006 |
| Priority date | — |
| Expiry date | Nov 13, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/083
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.