Patent · US Expired

Tundish and method for production of a metal strip of high purity

US7108048B2 · kind B2 · utility

1Cited by
2References
34Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 4, 2002
Grant dateSep 19, 2006
Priority date
Expiry dateJan 18, 2023

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB22D41/08
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

To achieve the highest possible separation rate for foreign particles in a tundish combined, at the same time, with a minimized level of inclusions, the refractory-lined interior space of the tundish, as a function of an operating bath level (h), satisfies the condition that a dimensionless ratio (κ) of the refractory-lined surface area (Aref) to the filling volume (V) which is delimited by this refractory-lined surface area and the bath-level-dependent exposed surface area (ATop) and results from the relationshipbe between 3.83 and 4.39.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.