Patent · US Expired

Method of chemical mechanical polishing using abrasive particles of alkaline earth metal salts

US7108586B2 · kind B2 · utility

0Cited by

8References

13Claims

0Family size

Assignee

Solvay Barium Strontium GmbH · DE

Inventors

Karl Koehler · Bad Salzdetfurth, DE
Ferdinand Hardinghaus · Bad Honnef, DE
Jai-Won Park · Oettingen, DE

Key dates

Filing date	Jun 18, 2004
Grant date	Sep 19, 2006
Priority date	—
Expiry date	Aug 2, 2024

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC09G1/02
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

Particles of strontium carbonate, barium carbonate, strontium sulfate and/or barium sulfate having a sufficient degree of fineness, especially when produced synthetically, are suitable as abrasive agents in chemical mechanical polishing (CMP polishing) of components, e.g., microelectronic components such as silicon wafers. The alkaline earth metal salt compounds are used as slurries in water and/or organic liquids and optionally may contain a dispersing agent, and preferably have a pH value of at least 8.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.