Dissolution inhibitors in photoresist compositions for microlithography

US7108953B2 · kind B2 · utility

Assignee

• E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

• Larry Berger · Chadds Ford, US
• Jerald Feldman · Wilmington, US
• Viacheslav A. Petrov · Hockessin, US
• Frank Leonard Schadt, III · Wilmington, US
• Andrew Edward Feiring · Wilmington, US
• Fredrick Claus Zumsteg, Jr. · Wilmington, US

Key dates

• Filing date: Oct 12, 2001
• Grant date: Sep 19, 2006
• Expiry date: Apr 9, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/108
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure —C(Rf)(Rf′)OR wherein Rf and Rf′ are the same or different fluoroalkyl groups of from one or taken together are (CF2)a wherein a is an integer ranging from 2 to about 10 and R is a hydrogen atom or an acid labile protecting group. Typically, the dissolution inhibitor has an absorption coefficient of less than about 4.0 μm at a wavelength of 157 nm.