Radiation-sensitive composition changing in refractive index and method of changing refractive index
US7108954B2 · kind B2 · utility
3Cited by
10References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 6, 2001 |
| Grant date | Sep 19, 2006 |
| Priority date | — |
| Expiry date | Jun 19, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.