Water-based resist stripping liquid management apparatus and water-based resist stripping liquid management method
US7109037B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 25, 2002 |
| Grant date | Sep 19, 2006 |
| Priority date | — |
| Expiry date | Oct 30, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/12
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the water concentration in the water-based resist stripping liquid and an electrical conductivity meter that measures the degraded component concentration in the water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, a resist stripping reclaimed liquid, pure water, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.