Patent · US Expired

Auto-focusing method and device for use with optical microscopy

US7109459B2 · kind B2 · utility

39Cited by
14References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 13, 2003
Grant dateSep 19, 2006
Priority date
Expiry dateApr 10, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B21/244
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An auto-focusing method and device are presented for determining an in-focus position of a sample supported on a substrate plate made of a material transparent with respect to incident electromagnetic radiation. The method utilizes an optical system capable of directing incident electromagnetic radiation towards the sample and collecting reflections of the incident electromagnetic radiation that are to be detected. A focal plane of an objective lens arrangement is located at a predetermined distance from a surface of the substrate, which is opposite to the sample-supporting surface of the substrate. A continuous displacement of the focal plane relative to the substrate along the optical axis of the objective lens arrangement is provided, while concurrently directing the incident radiation towards the sample through the objective lens arrangement to thereby focus the incident radiation to a location at the focal plane of the objective lens arrangement. Reflected components of the electromagnetic radiation to a location objective lens arrangement are continuously detected. The detected reflected components are characterized by a first intensity peak corresponding to an in-focus posit…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.