Patent · US Expired

Apparatus for and method of aligning a structure

US7110103B2 · kind B2 · utility

5Cited by
4References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 19, 2003
Grant dateSep 19, 2006
Priority date—
Expiry dateMay 19, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01C11/06
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An apparatus for determining the orientation and/or position of a structure comprises a light source (28) for generating a light beam. A structure (31) is mounted in the optical path of the light beam such that the position and/or orientation of the structure, relative to the light beam, may be altered. The apparatus further comprises first capture means (32) for capturing a diffraction pattern produced by the first structure. Information about the alignment of the structure may be obtained from the diffraction pattern, and the position and/or orientation of the structure (31) relative to the light beam may be adjusted if necessary.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.