Apparatus and method for in-situ measuring of vibrational energy in a process bath of a vibrational cleaning system
US7111517B2 · kind B2 · utility
1Cited by
9References
20Claims
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Key dates
| Filing date | Jul 29, 2004 |
| Grant date | Sep 26, 2006 |
| Priority date | — |
| Expiry date | Aug 30, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Apparatus and method are provided for in-situ measurement of vibrational energy applied to a wafer in a process bath of a vibrational cleaning system. The apparatus may be made up of a test wafer comprising an array of pressure sensing elements disposed thereon for monitoring power level variation of a time-varying pressure wave. The time-varying pressure wave is indicative of vibrational energy that would be applied to a wafer in the process bath in the position of the test wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.