Volatile noble metal organometallic complexes
US7112690B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 8, 2002 |
| Grant date | Sep 26, 2006 |
| Priority date | — |
| Expiry date | Mar 31, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07F15/0053
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A series of noble metal organometallic complexes of the general formula (I): MLaXb(FBC)c, wherein M is a noble metal such as iridium, ruthenium or osmium, and L is a neutral ligand such as carbonyl, alkene or diene; X is an anionic ligand such as chloride, bromide, iodide and trifluoroacetate group; and FBC is a fluorinated bidentate chelate ligand such as beta diketonate, beta-ketoiminate, amino-alcoholate and amino-alcoholate ligand, wherein a is an integer of from zero (0) to three (3), b is an integer of from zero (0) to one (1) and c is an 10 integer of from one (1) to three (3). The resulting noble metal complexes possess enhanced volatility and thermal stability characteristics, and are suitable for chemical vapor deposition(CVD) applications. The corresponding noble metal complex is formed by treatment of the FBC ligand with a less volatile metal halide. Also disclosed are CVD methods for using the noble metal complexes as source reagents for deposition of noble metal-containing films such as Ir, Ru and Os, or even metal oxide film materials IrO2, OsO2 and RuO2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.