Apparatus and method for solution plasma spraying
US7112758B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jan 12, 2004 |
| Grant date | Sep 26, 2006 |
| Priority date | — |
| Expiry date | Jan 12, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C4/123
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The apparatus for the thermal spray delivery of a precursor solution comprises a first solution reservoir, a second solution reservoir, singular or multiple atomizing liquid injector(s) disposed in fluid communication with the reservoirs, a flame source configured to direct a spray from the atomizing liquid injector to a substrate, and a thermal control device disposed in thermal communication with the substrate. The method of depositing a precursor solution at a substrate to form a coating comprises maintaining a substrate at a pre-selected temperature, delivering the precursor solution from a reservoir bank, atomizing the precursor solution, injecting the atomized precursor solution into a flame, and directing the flame to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.