Rotating surface of revolution reactor with temperature control mechanisms
US7115235B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 17, 2000 |
| Grant date | Oct 3, 2006 |
| Priority date | — |
| Expiry date | Feb 17, 2020 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/00076
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A reactor including a rotatable disc (3) having first (5, 19) and second (20, 30) surfaces. Reactant (15) is supplied to the first surface (5, 19) by way of a feed (4), the disc (3) is rotated at high speed, and the reactant (15) forms a film (17) on the surface (5, 19). As the reactant (15) traverses the surface (5, 19) of the disc (3), it undergoes chemical or physical processes before being thrown from the periphery of the disc (3) into collector means (7). Means for supplying a heat transfer fluid (35) to the second surface (20, 30) are also provided so as to allow the first surface (5, 19) and hence the reactant (15) to be cooled or heated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.