Distributed bragg reflector and method of fabrication
US7116483B2 · kind B2 · utility
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2References
10Claims
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Assignee
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Key dates
| Filing date | May 4, 2005 |
| Grant date | Oct 3, 2006 |
| Priority date | — |
| Expiry date | May 4, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/18363
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A distributed Bragg reflector and a method of fabricating the same incorporates a support for supporting the gaps against collapse. The method includes forming a plurality of alternating structure and sacrificial layers on a substrate. The structure and sacrificial layers are etched into at least one mesa protruding from the substrate. A support layer is formed on the at least one mesa leaving a portion of the structure and sacrificial layers exposed. At least a portion of at least one of the exposed sacrificial layers are etched from between the structure layers to form gaps between the structure layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.