Forming partial-depth features in polymer film
US7118833B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 26, 2003 |
| Grant date | Oct 10, 2006 |
| Priority date | — |
| Expiry date | Mar 14, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask (1900) for producing partial-depth features (712 and 912) in a photo-imageable polymer layer (412) on a wafer of a chip scale package (200) using exposure tools capable of resolving sizes of a critical dimension or larger, has a plurality of chrome lines (2101–2103). Each chrome line has a width (2105) that is less than the critical dimension, and each chrome line of the plurality of chrome lines is spaced apart less than the critical dimension. The plurality of chrome lines produces a single partial-depth feature, such as a via, through part of a thickness of the polymer layer. Alternatively, the photomask has a plurality of chrome circles (2206), each chrome circle having a diameter less than the critical dimension and being spaced apart less than the critical dimension, which produces the partial-depth feature. The photomask may also have chrome of width greater than the critical dimension and spaced from other chrome by a distance greater than the critical dimension, which produces a full-depth feature through the entire thickness of the polymer film. The partial-depth feature and the full-depth feature are produced substantially simultaneously during a single serie…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.