Method to protect internal components of semiconductor processing equipment using layered superlattice materials
US7119032B2 · kind B2 · utility
7Cited by
10References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2004 |
| Grant date | Oct 10, 2006 |
| Priority date | — |
| Expiry date | Oct 1, 2024 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/024
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
This invention relates to apparatus and a method to protect the internal components of semiconductor processing equipment such as a plasma reactor or a reactive species generator against physical and/or chemical damages during etching and/or cleaning processes. Layered superlattice materials having three or more metal elements such as strontium bismuth tantalate (SBT) are used to form a protective barrier on the surfaces of the internal components of a reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.