Method of improving stability in OLED devices
US7121912B2 · kind B2 · utility
2Cited by
3References
5Claims
0Family size
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Key dates
| Filing date | Jan 26, 2004 |
| Grant date | Oct 17, 2006 |
| Priority date | — |
| Expiry date | Jan 23, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/60
Abstract
A method of treating a cathode of an OLED device having a substrate and which has a spaced anode and organic layers between the anode and cathode includes evacuating a chamber so that it has a pressure no greater than 10−6 Torr; heating the OLED substrate in the chamber to a temperature less than 100° C.; and delivering gas, including ozone, to the evacuated chamber which includes the heated OLED substrate at a sufficient rate so that the pressure is less than 1 atmosphere, so that the life of the OLED substrate is increased and the operating voltage is decreased.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.