Method for vacuum deposit on a curved substrate
US7122223B1 · kind B1 · utility
4Cited by
10References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 2, 1999 |
| Grant date | Oct 17, 2006 |
| Priority date | — |
| Expiry date | Sep 2, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/044
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention concerns a method which consists in a process known per se in producing, on the curved substrate (10) to be treated, a film of material derived from a specific material source (13). The invention is characterized in that it consists in inserting, between the curved substrate (10) and the material source (13), a mask (19) relative to the curved substrate (10), preferably selecting as mask (19), a mask comprising a ring-shaped part (20). The invention is particularly useful for providing lenses with antiglare treatment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.