Compounds that release nitric oxide at controlled rates upon photolysis
US7122529B2 · kind B2 · utility
33Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 12, 2002 |
| Grant date | Oct 17, 2006 |
| Priority date | — |
| Expiry date | May 21, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07D295/28
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Chemical compounds which release nitric oxide in a controlled manner upon photolysis with light are provided. These compounds are O2-benzyl, O2-naphthylmethyl and O2-naphthylallyl substituted diazeniumdiolates. Also provided are methods of preparing these novel compounds in high chemical yields as well as methods of using these compounds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.