Thermal management of projection apparatus
US7128421B2 · kind B2 · utility
3Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2004 |
| Grant date | Oct 31, 2006 |
| Priority date | — |
| Expiry date | Mar 29, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N9/3194
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A projection apparatus is formed employing a solid state light source having either an associated or integrated sensor to monitor a thermal condition of a region of the solid state light source. The sensor is equipped to output a signal indicative of the thermal condition of the monitored region. In various embodiments, a controller is also provided to conditionally initiate one or more thermal management actions based at least in part on the thermal condition of the region as indicated by the signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.