Patent · US Expired

Process for manufacturing high purity methacrylic acid

US7128813B2 · kind B2 · utility

0Cited by
12References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 22, 2003
Grant dateOct 31, 2006
Priority date
Expiry dateMar 6, 2024

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S203/22
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A process for the high yield production of high purity glacial methacrylic acid (“HPMAA”) with minimization of decomposition of hydroxy isobutyric acid (HIBA). The HPMAA is substantially pure, specifically 99% pure or greater with a water content of 0.05% or less. This improved process involves the steps of providing a crude MAA stream which was formed by hydrolyzing acetone cyanohydrin and, therefore, includes HIBA which is an intermediate product of the hydrolysis reaction, and purifying that crude methacrylic acid stream in a series of successive distillation steps.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.