Electron beam physical vapor deposition process
US7128950B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 8, 2004 |
| Grant date | Oct 31, 2006 |
| Priority date | — |
| Expiry date | Apr 30, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3132
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An electron beam physical vapor deposition (EBPVD) process performed with a coating apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber operated at an elevated temperature and a subatmospheric pressure. The coating chamber contains a crucible and a coating material surrounded by and contained within the crucible, and the coating material has a surface exposed by the crucible. The process entails projecting an electron beam onto the surface of the coating material, wherein the electron beam defines a beam pattern having a higher intensity at an interface of the surface of the coating material with the crucible than at a central region of the surface of the coating material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.