Substrates for in particular microlithography

US7129010B2 · kind B2 · utility

Assignee

• Schott AG · DE

Inventors

• Jochen Alkemper · Klein-Winternheim, DE
• Lutz Aschke · Mainz, DE
• Hrabanus Hack · Mainz, DE

Key dates

• Filing date: Jul 25, 2003
• Grant date: Oct 31, 2006
• Expiry date: Apr 28, 2024

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/265
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The present invention relates to a substrate in particular of EUV microlithography, to the production of a substrate of this type and to the use of this substrate as a substrate for mirrors and/or masks or mask blanks in particular in EUV microlithography.