System for and method of manufacturing a large-area backplane by use of a small-area shadow mask
US7132016B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 25, 2004 |
| Grant date | Nov 7, 2006 |
| Priority date | — |
| Expiry date | Oct 11, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/908
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vapor deposition shadow mask system includes a number of series connected vacuum vessels each having a material deposition source and shadow mask positioned therein. A substrate is translated along a path that has a longitudinal axis that extends through the vacuum vessels. Centers of shadow masks in first and second vacuum vessels are offset laterally on opposite sides of the longitudinal axis. The system is operative for depositing material on a second area of the substrate via the material deposition source and shadow mask in the second vacuum vessel in a manner that overlaps a portion of the material deposited on a first, adjacent area of the substrate via the material deposition source and shadow mask in the first vacuum vessel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.