Polishing cloth
US7134952B2 · kind B2 · utility
2Cited by
6References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2003 |
| Grant date | Nov 14, 2006 |
| Priority date | — |
| Expiry date | Mar 29, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24314
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A polishing cloth has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells and the non-foamed layer having an externally exposed surface where linear cuts are formed. These linear cuts reach the air bubble cells such that the air bubble cells communicate with the exterior through the linear cuts. These linear cuts are controlled to be 10 μm or less in length.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.