Patent · US Expired

Micromirrors for micro-electro-mechanical systems and methods of fabricating the same

US7139111B1 · kind B1 · utility

0Cited by

5References

20Claims

0Family size

Assignee

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. · TW

Inventors

Shen-Ping Wang · Keelung, TW
Alan Lee · Fremont, US
Chia-Chiang Chen · Hsinchu, TW

Key dates

Filing date	Apr 28, 2005
Grant date	Nov 21, 2006
Priority date	—
Expiry date	May 27, 2025

Classification

Technology area (CPC G)Physics
CPC primaryG02B5/0808
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A micromirror for micro-electro-mechanical systems. The micromirror comprises a pad layer, a doped aluminum layer containing 0.002 wt % to 0.3 wt % of silicon overlying the pad layer and a protective layer overlying the doped aluminum layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.