Patent · US Expired

Optical element, method of producing optical elements, coating device, and coating method

US7139460B2 · kind B2 · utility

0Cited by
3References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 30, 2002
Grant dateNov 21, 2006
Priority date
Expiry dateMay 30, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B2006/121
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of producing optical elements using a substrate having a recess, which is capable of easily removing a film in the recess, and optical elements formed. The optical element comprises a substrate 1, an optical waveguide structure layer 10 of resin disposed in a part of the region on the substrate 1, and a recess 21 formed in the region where the optical waveguide structure layer 10 is not disposed. The optical waveguide structure layer 10 includes an optical waveguide 4 and a clad layer. A coupler layer is disposed between the substrate 1 and the optical waveguide structure layer 10, and the film thickness distribution range of the coupler layer in the region below the optical waveguide 4 is such that the minimum film thickness is not more than 30 angstroms and the maximum film thickness is not less than 20 angstroms.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.