Oxide sintered body and sputtering target, and manufacturing method for transparent conductive oxide film as electrode
US7141186B2 · kind B2 · utility
11Cited by
0References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 28, 2003 |
| Grant date | Nov 28, 2006 |
| Priority date | — |
| Expiry date | May 18, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2235/9653
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific resistance is 1 k.cm or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.