Magnetoresistive effect thin-film magnetic head and manufacturing method of magnetoresistive effect thin-film magnetic head
US7141508B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 7, 2002 |
| Grant date | Nov 28, 2006 |
| Priority date | — |
| Expiry date | May 29, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/39
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A manufacturing method of an MR thin-film magnetic head with an MR film and lead conductors overlapping each other, includes a step of depositing a conductor layer on at least the magnetoresistive effect film, a step of forming a cap layer patterned on the deposited conductor layer, and a step of dry-etching the deposited conductor layer through a mask of the patterned cap layer using an Ar gas and an O2 gas, an O2 gas or a N2 gas so as to pattern the deposited conductor film to form the lead conductors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.