Patent · US Expired

Device and method for maskless AFM microlithography

US7141808B2 · kind B2 · utility

3Cited by

2References

23Claims

0Family size

Inventors

Ivo Rangelow · Kirchbauna, DE
Tzwetan Ivanov · Bad Orb, DE
Peter Hudek · Bratislava, SK
Olaf Fortagne · Jena, DE

Key dates

Filing date	Mar 14, 2003
Grant date	Nov 28, 2006
Priority date	—
Expiry date	Apr 5, 2023

Classification

Technology area (CPC G)Physics
CPC primaryG11B9/1409
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to a device and a method for maskless microlithography. Several microstructured cantilevers (2) are arranged in an array (26) and an actuator is integrated in each of the cantilevers (2) of the array (26). A power supply and control unit (24) is provided, said unit adjusting the distance of the cantilevers (6) relative to a surface (4) that is to be structured by means of an appropriate voltage. Every point of the needles (6) is connected to said power supply and control unit (24). In order to implement the inventive method, an array (26) with cantilevers, each of which carries a point of a needle (6), is brought into contact with a surface (4) to be structured in such a way that the points of the needles (6) are arranged close to the surface (4) to be structured.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.