System and method for programmable illumination pattern generation
US7144119B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 24, 2001 |
| Grant date | Dec 5, 2006 |
| Priority date | — |
| Expiry date | Nov 4, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N15/149
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus providing programmable illumination pattern generation for the manipulation of colloidal particulates and biomolecules in suspension between electrodes, is disclosed. The apparatus implements LEAPS (Light-controlled electrokinetic assembly of particles near surfaces), which relies on: AC electric field-induced assembly of particles the patterning of the electrolyte/silicon oxide/silicon interface to exert spatial control over the assembly process; and the real-time control of the assembly process via external illumination. The apparatus generates patterns of illumination and projects then onto planar surfaces, i.e., a LEAPS electrode. This enables the creation of patterns using graphical design or drawing software on a personal computer and the projection or said patterns, or sequences of patterns (“time-varying patterns”), onto the interface using a liquid crystal display (LCD) panel and an optical design which images the LCD panel onto the surface of interest, to provide for arrangements and assembly of particles in such patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.