Patent · US Expired

Multilayer microcavity devices and methods

US7144486B1 · kind B1 · utility

32Cited by
41References
35Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 12, 2001
Grant dateDec 5, 2006
Priority date
Expiry dateAug 17, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N27/403
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Microcavities and micropores that are microscopic (<1 mm) in width and depth and contain any number of individually-addressable electrodes, separated by insulators, along the walls of each cavity. The conducting materials, and the insulator materials can be deposited alternately onto a starting substrate, which is typically an oxidized silicon wafer or polyimide film, but may be any substrate that shows good adhesion to the materials layered on it. The cavities are etched through these layers, perpendicular to the plane of the substrate, exposing the layers at their edges. Pores may be carved entirely through the device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.