Imprint method and device
US7144539B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 4, 2002 |
| Grant date | Dec 5, 2006 |
| Priority date | — |
| Expiry date | Aug 21, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/263
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
An imprint process comprises the step of aligning a substrate, supported on a first support member, with a template, supported on a second support member. The substrate has at least one essentially plane surface provided with a moldable film. The template has at least one essentially plane surface provided with a relief pattern. The relief pattern is adapted to interact with the moldable film. The process further comprises the step of arranging a sealing gasket between the template and the second support member, such that a pressure cavity is defined by the second support member, the template and the sealing gasket. The process also comprises the step of applying a static gas pressure to the pressure cavity, in order to provide a pressure between the template and the substrate. The pressure is sufficient to form a pattern in the moldable film. An imprint device is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.